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Bias-Temperature-Instabilities in MOSFETs with high-k dielectrics


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  • Product Description

New MOSFET architectures are presently being developed in which dielectrics with high permittivity are introduced to replace SiO2-based dielectrics, which are at the end of the scaling roadmap, and where also metal gates are used to replace poly-Si gate to avoid poly-depletion effects. Key in the success of this development is the electrical behavior of such high k/metal gate devices, and more specifically the Bias-Temperature- Instabilities, which are well-known reliability problems in MOS gate stacks. In this thesis, these Bias-Temperature effects will be investigated: the electrical behavior of the devices under Bias- Temperature stress will be characterized, models to explain the instability effects will be developed, the impact of processing, material composition and deposition techniques, annealing conditions etc. will be investigated, and ways to improve these BTI effects will be proposed. This work should ultimately lead to optimized gate stacks with higher BTI robustness

Product Specifications
SKU :COC39625
AuthorMarc Aoulaiche,Guido Groeseneken and Herman Maes
Number of Pages224
Publishing Year6/22/2010
Edition453 st
Book TypeElectronics & communications engineering
Country of ManufactureIndia
Product BrandLAP LAMBERT Academic Publishing
Product Packaging InfoBox
In The Box1 Piece
Product First Available On ClickOnCare.com2015-01-08 00:00:00