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Defect engineering in H and He implanted Silicon


Marketed By :  VDM Verlag Dr. Müller   Sold By :  Kamal Books International  
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  • Product Description

Hydrogen and Helium implanted Si is investigated by electron, optical and atomic force microscopy techniques and x-ray diffraction. In a first moment, the macro-mechanisms of surface blistering and exfoliation were studied as function of the implantation parameters and annealing protocols. Two mechanisms were depicted: i) cracks coalescence and; ii) unstable fracture. The distinct developments were related to microstructure evolutions and discussed in terms of solid mechanics. Particularly, unstable fracture leads to a new method for self-standing Si thin films synthesis via surface delamination. The second moment of the work consists of exploratory experiments revealing unique nanoscopic phenomena. The mechanisms of nanocracks interaction were indentified and modeled under fracture mechanics theory. The elastic interaction between precipitates, giving rise to arranged tridimensional nanostructures was also demonstrated and modeled. This particular result set the basis for further developments in nanostructures architecture within a crystalline matrix showing that strain engineering can provide an affordable way to manipulate precipitates in nanometric scale.

Product Specifications
SKU :COC39553
AuthorShay Reboh
Number of Pages136
Publishing Year2010-07-04T00:00:00.000
Edition381 st
Book TypePhysics
Country of ManufactureIndia
Product BrandVDM Verlag Dr. Müller
Product Packaging InfoBox
In The Box1 Piece
Product First Available On ClickOnCare.com2015-01-08 00:00:00