This Thesis discusses the basic principles of Lithographic techniques incorporating the use of positive and negative photoresists applications, synthetic techniques of photo imaging compounds and light sensitive materials, uses of novel chlorinating agents at mild conditions, direct esterification of sulfonicacid or salts, photochemical studies of photo activating compounds, resolution and optimization of the photo imaging compounds in nanolithographic applications. Preparative and HPLC standardization methods of photo activating compounds. Synthesis of photo acid generators for nanotechnology applications, these are used in the microelectronic industry. The microelectronic industry has made remarkable progress with the development of integrated circuit (IC) technology. Although EUV lithography at 13.5 nm wavelength has emerged as a promising candidate to meet the resolution requirements of the microelectronic industry roadmap, yet the development of advanced photoresist materials with all of the required imaging properties is still challenging and is one of the major subjects of current nanolithography research.