☰ Category

Hafnium Oxide And Hafnium Silicate For High-k Application


Marketed By :  LAP LAMBERT Academic Publishing   Sold By :  Kamal Books International  
Delivery in :  10-12 Business Days


Check Your Delivery Options

Product Out of Stock Subscription

(Notify me when this product is back in stock)

Rs. 5,886

Availability: Out of stock

  • Product Description

Novel materials with high-dielectric(k) constants are rapidly gaining attention for their application as gate insulator for future MOS transistors. This book provides the basic principles underlying chemical vapor deposition (CVD) of hafnium oxide and hafnium silicate thin films for high-k application. In addition to the deposition fundamentals, the discussions in the book provide valuable insights to various chemical and physical characterization techniques that can be applied to thin films in general. This easy-to-understand and well- illustrated text is designed for both beginners as well as advanced researchers with a good introduction to the subject of high-k thin films.

Product Specifications
SKU :COC28626
AuthorHarish Bhandari
Number of Pages232
Publishing Year9/15/2010
Edition1 st
Book TypeChemical engineering
Country of ManufactureIndia
Product BrandLAP LAMBERT Academic Publishing
Product Packaging InfoBox
In The Box1 Piece
Product First Available On ClickOnCare.com2015-07-29 00:00:00
0 Review(s)