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Internal Stress of Thin Film

 

Marketed By :  VDM Verlag Dr. Müller   Sold By :  Kamal Books International  
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  • Product Description
 

Stress is a very important parameter which determines the reliability and life-time of thin film. Over 60% rejection of the electronic devices is due to stress failure. Stress can play an important role in the electrodeposited film as recrystallization can occur over times from several minutes to several years after electrodeposition. A critical analysis on the theoretical formulations and models of internal stress are reviewed in this book. A details literature of internal stress and it''s co-relation with deposition parameters are included in this book. The work was mainly focused on the real time stress change of the electrodeposited Cu film during deposition and room temperature aging. In this book, different set-up for the measurement of in-situ and real time stress of electrodeposited films are discussed.

Product Specifications
SKU :COC21669
AuthorTamjid Chowdhury
LanguageEnglish
BindingPaperback
Number of Pages172
Publishing Year10/17/2010
ISBN978-3639303230
Edition1 st
Book TypeAerospace & aviation technology
Country of ManufactureIndia
Product BrandVDM Verlag Dr. Müller
Product Packaging InfoBox
In The Box1 Piece
Product First Available On ClickOnCare.com2015-07-28 00:00:00