The dense plasma focus system of energy 2.3 kJ was used to synthesize titanium based nitride thin films. The book contains the details of research work including the introduction, plasma focus experimental setup, results obtained and their detailed discussion. It reports growth of titanium based nitride thin films specifically titanium-aluminum nitrides, nano composite-titanium nitride/amorphous-silicon nitride, nano composite (titanium, aluminum) nitride/ amorphous-silicon nitride and titanium-silicon-nitride. The results of these experiments show the successful synthesis of titanium based nitride thin films using the plasma focus system. The research work is motivated by the remarkable mechanical, thermal and electronic properties of titanium based nitride thin films, having many applications ranging from coatings on cutting tools to diffusion barrier in microelectronics.