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The Variation of Hydrogen Concentration in Ni/MgH Thin Film With Temperature

 

Marketed By :  LAP LAMBERT Academic Publishing   Sold By :  Kamal Books International  
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  • Product Description
 

The thermal stability of Ni/MgH thin film deposited on Si substrate by Unbalanced Magnetron Physical Vapor Deposition has been investigated using Ion Beam analysis (IBA) techniques. Rutherford Back-scattering Spectrometry (RBS) and Non-Rutherford Back scattering Spectrometry (NRBS) have been used to find the composition of Magnesium, Nickel and Oxygen. Elastic Recoil Detection Analysis (ERDA) has been used to determine the concentration of hydrogen at each level of heating. Heating was done in the Ultra High Vacuum (UHV) environment using a non gassy button heater. Ni/MgH sample had lost most of its hydrogen after being heated to a temperature of about 125 degree Celsius in vacuum. However, the onset temperature of hydrogen loss from the sample was found to be within 21 and 50 degree Celsius. The interface regions between the film and the substrate and between Ni and MgH layers were unaffected by this operation.

Product Specifications
SKU :COC50044
AuthorRex Taibu
LanguageEnglish
BindingPaperback
Number of Pages52
Publishing Year2012-12-29T00:00:00.000
ISBN978-3659316005
Edition1 st
Book TypePhysics
Country of ManufactureIndia
Product BrandLAP LAMBERT Academic Publishing
Product Packaging InfoBox
In The Box1 Piece
Product First Available On ClickOnCare.com2015-06-08 00:00:00