Transient Properties of HiPIMS Discharges


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  • Product Description

HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions.

Product Specifications
SKU :COC55101
AuthorAnurag Mishra
Number of Pages212
Publishing Year2014-05-19T00:00:00.000
Edition1 st
Book TypePhysics
Country of ManufactureIndia
Product BrandScholars' Press
Product Packaging InfoBox
In The Box1 Piece
Product First Available On ClickOnCare.com2015-06-08 00:00:00
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